Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au-Al2O3-Cr metal-insulator-metal structures

Type:
Journal
Info:
Phys. Rev. B 96, 115435, 2017
Date:
2017-09-17

Author Information

Name Institution
L. Fry-BouriauxUniversity of Leeds
M. C. RosamondUniversity of Leeds
D. A. WilliamsHitachi Cambridge Laboratory
A. G. DaviesUniversity of Leeds
C. WaltiUniversity of Leeds

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Current Density
Analysis: I-V, Current-Voltage Measurements

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Substrates

SiO2
Au
Cr

Keywords

Notes

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