Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Propagating gene expression fronts in a one-dimensional coupled system of artificial cells

Type:
Journal
Info:
Nature Physics (2015)
Date:
2015-09-21
DOI:
http://dx.doi.org/10.1038/nphys3469

Author Information

Name Institution
Alexandra M. TayarWeizmann Institute of Science
Eyal KarzbrunWeizmann Institute of Science
Vincent NoireauxUniversity of Minnesota
Roy H. Bar-ZivWeizmann Institute of Science

Films

Plasma SiO2

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Silicon

Notes

401