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Optical in situ monitoring of plasma-enhanced atomic layer deposition process
The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
Texture of atomic layer deposited ruthenium
Comparative study of structural electrical dielectric and ferroelectric properties of HfO2 deposited by plasma-enhanced atomic layer deposition and radio frequency sputtering technique for the application in 1-T FeFET
Propagating gene expression fronts in a one-dimensional coupled system of artificial cells
Type:
Journal
Info:
Nature Physics (2015)
Date:
2015-09-21
Author Information
| Name | Institution |
|---|---|
| Alexandra M. Tayar | Weizmann Institute of Science |
| Eyal Karzbrun | Weizmann Institute of Science |
| Vincent Noireaux | University of Minnesota |
| Roy H. Bar-Ziv | Weizmann Institute of Science |
Films
Plasma SiO2
Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
Film/Plasma Properties
Substrates
| Silicon |
Keywords
Notes
| 401 |