Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Impact of degradable nanowires on long-term brain tissue responses

Type:
Journal
Info:
J Nanobiotechnol (2016) 14:64
Date:
2016-08-23
DOI:
http://dx.doi.org/10.1186/s12951-016-0216-7

Author Information

Name Institution
Lina GällentoftLund University
Lina M. E. PetterssonLund University
Nils DanielsenLund University
Jens SchouenborgLund University
Christelle N. PrinzLund University
Cecilia Eriksson LinsmeierLund University

Films

Plasma SiO2

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Notes

1156