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Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
Innovative remote plasma source for atomic layer deposition for GaN devices
Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
Optical in situ monitoring of plasma-enhanced atomic layer deposition process
The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
Type:
Journal
Info:
physica status solidi (RRL) - Rapid Research Letters Volume 9, Issue 9, pages 516--520, 2015
Date:
2015-08-31
Author Information
| Name | Institution |
|---|---|
| Jan M. Macak | University of Pardubice |
| Jan Prikryl | University of Pardubice |
| Hanna Sopha | University of Pardubice |
| Lukas Strizik | University of Pardubice |
Films
Plasma In2O3
Film/Plasma Properties
Substrates
Keywords
Notes
| 420 |