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Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
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Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
Type:
Journal
Info:
physica status solidi (RRL) - Rapid Research Letters Volume 9, Issue 9, pages 516--520, 2015
Date:
2015-08-31
Author Information
| Name | Institution |
|---|---|
| Jan M. Macak | University of Pardubice |
| Jan Prikryl | University of Pardubice |
| Hanna Sopha | University of Pardubice |
| Lukas Strizik | University of Pardubice |
Films
Plasma In2O3
Film/Plasma Properties
Substrates
Keywords
Notes
| 420 |