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Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
Gallium nitride thin films by microwave plasma-assisted ALD
Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
Type:
Journal
Info:
physica status solidi (RRL) - Rapid Research Letters Volume 9, Issue 9, pages 516--520, 2015
Date:
2015-08-31
Author Information
| Name | Institution |
|---|---|
| Jan M. Macak | University of Pardubice |
| Jan Prikryl | University of Pardubice |
| Hanna Sopha | University of Pardubice |
| Lukas Strizik | University of Pardubice |
Films
Plasma In2O3
Film/Plasma Properties
Substrates
Notes
| 420 |