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Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
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Publication Information
Title:
Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition
Type:
Journal
Info:
physica status solidi (RRL) - Rapid Research Letters Volume 9, Issue 9, pages 516--520, 2015
Date:
2015-08-31
Author Information
| Name | Institution |
|---|---|
| Jan M. Macak | University of Pardubice |
| Jan Prikryl | University of Pardubice |
| Hanna Sopha | University of Pardubice |
| Lukas Strizik | University of Pardubice |
Films
Plasma In2O3
Film/Plasma Properties
Substrates
Keywords
Notes
| 420 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |