Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Antireflection In2O3 coatings of self-organized TiO2 nanotube layers prepared by atomic layer deposition

Type:
Journal
Info:
physica status solidi (RRL) - Rapid Research Letters Volume 9, Issue 9, pages 516--520, 2015
Date:
2015-08-31
DOI:
http://dx.doi.org/10.1002/pssr.201510245

Author Information

Name Institution
Jan M. MacakUniversity of Pardubice
Jan PrikrylUniversity of Pardubice
Hanna SophaUniversity of Pardubice
Lukas StrizikUniversity of Pardubice

Films

Plasma In2O3

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
Cyclopentadienylindium(I), InCp
CAS#: 34822-89-4
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 250C

Film/Plasma Properties

Substrates

Notes

420