Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions

Type:
Journal
Info:
Engineering Reports. 2020;e12303.
Date:
2020-09-21

Author Information

Name Institution
Ankit Kumar SinghGeorgia Institute of Technology
Katarina AdstedtGeorgia Institute of Technology
Tianxin MiaoGeorgia Institute of Technology
Julie ChampionGeorgia Institute of Technology
Preet M. SinghGeorgia Institute of Technology
Samuel GrahamGeorgia Institute of Technology

Films

Plasma Al2O3





Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Cytocompatibility
Analysis: MTT Cell Proliferation Test

Characteristic: Stability
Analysis: EIS, Electrochemical Impedance Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

Si(100)

Keywords

Notes

1546