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Stability of plasma-enhanced atomic layer deposited barrier films in biological solutions
Type:
Journal
Info:
Engineering Reports. 2020;e12303.
Date:
2020-09-21
Author Information
| Name | Institution |
|---|---|
| Ankit Kumar Singh | Georgia Institute of Technology |
| Katarina Adstedt | Georgia Institute of Technology |
| Tianxin Miao | Georgia Institute of Technology |
| Julie Champion | Georgia Institute of Technology |
| Preet M. Singh | Georgia Institute of Technology |
| Samuel Graham | Georgia Institute of Technology |
Films
Plasma Al2O3
Plasma HfO2
Plasma TiO2
Plasma ZrO2
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Cytocompatibility
Analysis: MTT Cell Proliferation Test
Characteristic: Stability
Analysis: EIS, Electrochemical Impedance Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Substrates
| Si(100) |
Notes
| 1546 |