The Mechanical Behavior of ALD-Polymer Hybrid Films Under Tensile Strain

Type:
Journal
Info:
Advanced Engineering Materials
Date:
2014-11-16
DOI:
http://dx.doi.org/10.1002/adem.201400431

Author Information

Name Institution
Anuradha BulusuGeorgia Institute of Technology

Films

Plasma Al2O3

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Plasma TiO2

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti
CAS#: 3275-24-9
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Unknown
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Unknown
Analysis: TOF-SIMS, Time of Flight Secondary Ion Mass Spectrometry
Diagnostic: -

Characteristic: Mechanical Properties
Analysis: Tensile Testing
Diagnostic: -

Substrates

PET, Polyethylene Terephthalate
Cytop
PEIE, PolyEthyleneImine Ethoxylated
PHOST, PolyHydrOxySTyrene

Notes

Ultratech Fiji PEALD Al2O3 and TiO2 mechanical behavior on polymeric substrates study.
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