Publication Information

Title:
New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping
Type:
Journal
Info:
J. Vac. Sci. Technol. A 31(1), Jan/Feb 2013
Date:
2012-11-27

Author Information

Name Institution
Matthew A. ThomasUniversity of Arkansas at Little Rock
Johnathan C. ArmstrongUniversity of Arkansas at Little Rock
J.B. CuiUniversity of Arkansas at Little Rock

Films


Thermal ZnO


Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Optical Properties
Analysis: PL, PhotoLuminescence

Characteristic: Electrical Properties
Analysis: Hall Measurements

Substrates

Glass
Si(100)
SiO2

Keywords

Notes

PET-ALD: plasma enhanced thermal ALD with H2O thermal followed by H2 plasma.
Aluminum doping of ZnO better with DMAI than TMA.
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