Publication Information

Title: New approach toward transparent and conductive ZnO by atomic layer deposition: Hydrogen plasma doping

Type: Journal

Info: J. Vac. Sci. Technol. A 31(1), Jan/Feb 2013

Date: 2012-11-27

DOI: http://dx.doi.org/10.1116/1.4768172

Author Information

Name

Institution

University of Arkansas at Little Rock

University of Arkansas at Little Rock

University of Arkansas at Little Rock

Films

Deposition Temperature = 200C

557-20-0

7732-18-5

1333-74-0

Deposition Temperature = 200C

557-20-0

7732-18-5

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Morphology, Roughness, Topography

SEM, Scanning Electron Microscopy

JEOL JSM-7000F

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Bruker D8 Discover

Optical Properties

PL, PhotoLuminescence

Horiba Jobin Yvon 320 Spectrometer

Electrical Properties

Hall Measurements

Keithley 7065 Hall Effect Card

Substrates

Glass

Si(100)

SiO2

Keywords

Notes

PET-ALD: plasma enhanced thermal ALD with H2O thermal followed by H2 plasma.

Aluminum doping of ZnO better with DMAI than TMA.

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