Publication Information

Title: The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO

Type: Journal

Info: ECS Transactions, 45 (7) 87-95 (2012)

Date: 2012-05-08

DOI: http://dx.doi.org/10.1149/1.3701529

Author Information

Name

Institution

University of Arkansas at Little Rock

University of Arkansas at Little Rock

Films

Deposition Temperature = 200C

557-20-0

7782-44-7

Deposition Temperature = 200C

557-20-0

7782-44-7

7732-18-5

Deposition Temperature = 200C

557-20-0

7732-18-5

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Optical Properties

Optical Transmission

Angstrom Sun Technologies UV/Vis Reflectometer

Optical Properties

Optical Absorption

Angstrom Sun Technologies UV/Vis Reflectometer

Near Band Emission (NBE)

PL, PhotoLuminescence

Horiba Jobin Yvon 320 Spectrometer

Photoluminescence

PL, PhotoLuminescence

Horiba Jobin Yvon 320 Spectrometer

Photoluminescence

Low Temperature Photoluminescence

Unknown

Substrates

Glass

Si(100)

Keywords

Optical

PEALD Film Development

Photoluminescence

Notes

Ultratech Fiji PEALD and hybrid thermal/plasma ALD ZnO film development.

166



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