Publication Information

Title: The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO

Type: Journal

Info: ECS Transactions, 45 (7) 87-95 (2012)

Date: 2012-05-08

DOI: http://dx.doi.org/10.1149/1.3701529

Author Information

Name

Institution

University of Arkansas at Little Rock

University of Arkansas at Little Rock

Films

Deposition Temperature = 200C

557-20-0

7782-44-7

Deposition Temperature = 200C

557-20-0

7782-44-7

7732-18-5

Deposition Temperature = 200C

557-20-0

7732-18-5

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Optical Properties

Optical Transmission

Angstrom Sun Technologies UV/Vis Reflectometer

Optical Properties

Optical Absorption

Angstrom Sun Technologies UV/Vis Reflectometer

Near Band Emission (NBE)

PL, PhotoLuminescence

Horiba Jobin Yvon 320 Spectrometer

Photoluminescence

PL, PhotoLuminescence

Horiba Jobin Yvon 320 Spectrometer

Photoluminescence

Low Temperature Photoluminescence

-

Substrates

Glass

Si(100)

Keywords

Optical

PEALD Film Development

Photoluminescence

Notes

Ultratech Fiji PEALD and hybrid thermal/plasma ALD ZnO film development.

166



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