The Effects of an O2 Plasma on the Optical Properties of Atomic Layer Deposited ZnO

Type:
Journal
Info:
ECS Transactions, 45 (7) 87-95 (2012)
Date:
2012-05-08
DOI:
http://dx.doi.org/10.1149/1.3701529

Author Information

Name Institution
Matthew A. ThomasUniversity of Arkansas at Little Rock
J.B. CuiUniversity of Arkansas at Little Rock

Films

Plasma ZnO

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
DEZ, diethyl zinc, ZnEt2
CAS#: 557-20-0
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 200C

Other ZnO

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
DEZ, diethyl zinc, ZnEt2
CAS#: 557-20-0
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
Deposition Temperature = 200C

Thermal ZnO

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
DEZ, diethyl zinc, ZnEt2
CAS#: 557-20-0
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
Deposition Temperature = 200C

Film/Plasma Properties

Characteristic: Optical Properties
Analysis: Optical Transmission
Diagnostic: Angstrom Sun Technologies UV/Vis Reflectometer

Characteristic: Optical Properties
Analysis: Optical Absorption
Diagnostic: Angstrom Sun Technologies UV/Vis Reflectometer

Characteristic: Near Band Emission (NBE)
Analysis: PL, PhotoLuminescence
Diagnostic: Horiba Jobin Yvon 320 Spectrometer

Characteristic: Photoluminescence
Analysis: PL, PhotoLuminescence
Diagnostic: Horiba Jobin Yvon 320 Spectrometer

Characteristic: Photoluminescence
Analysis: Low Temperature Photoluminescence
Diagnostic: -

Substrates

Glass
Si(100)

Notes

Ultratech Fiji PEALD and hybrid thermal/plasma ALD ZnO film development.
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