Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition

Type:
Journal
Info:
Langmuir, 2015, 31 (18), pp 5057-5062
Date:
2015-04-03

Author Information

Name Institution
Peter SchindlerStanford University
Manca LogarNational Institute of Chemistry Slovenia
J ProvineStanford University
Fritz B. PrinzStanford University

Films



Film/Plasma Properties

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Substrates

Keywords

Notes

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