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Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
Type:
Journal
Info:
Langmuir, 2015, 31 (18), pp 5057-5062
Date:
2015-04-03
Author Information
| Name | Institution |
|---|---|
| Peter Schindler | Stanford University |
| Manca Logar | National Institute of Chemistry Slovenia |
| J Provine | Stanford University |
| Fritz B. Prinz | Stanford University |
Films
Thermal TiO2
Plasma TiO2
Film/Plasma Properties
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Substrates
Notes
| 347 |