Publication Information

Title: Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells

Type: Journal

Info: IEEE J. Photovolt., Vol. 6, No. 4, July 2016, pp. 869-874

Date: 2016-05-12

DOI: http://dx.doi.org/10.1109/JPHOTOV.2016.2556982

Author Information

Name

Institution

Georgia Institute of Technology

Georgia Institute of Technology

Georgia Institute of Technology

Films

Deposition Temperature Range N/A

75-24-1

7732-18-5

Deposition Temperature Range N/A

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Surface Recombination Velocity

Unknown

Unknown

Efficiency

Unknown

Unknown

Substrates

Silicon

Keywords

Passivation

Solar

Notes

870



Shortcuts



© 2014-2019 plasma-ald.com