
Investigation of Atomic Layer Deposition Al2O3 Passivation for Screen-Printed Large-Area Solar Cells
Type:
Journal
Info:
IEEE J. Photovolt., Vol. 6, No. 4, July 2016, pp. 869-874
Date:
2016-05-12
Author Information
Name | Institution |
---|---|
Moon Hee Kang | Georgia Institute of Technology |
Young-Woo Ok | Georgia Institute of Technology |
Ajeet Rohatgi | Georgia Institute of Technology |
Films
Thermal Al2O3
Plasma Al2O3
Film/Plasma Properties
Characteristic: Surface Recombination Velocity
Analysis: -
Characteristic: Efficiency
Analysis: -
Substrates
Silicon |
Notes
870 |