Publication Information

Title:
Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films
Type:
Journal
Info:
Journal of Applied Physics 125, 045301 (2019)
Date:
2018-12-30

Author Information

Name Institution
Kyungjin KimGeorgia Institute of Technology
Olivier N PierronGeorgia Institute of Technology
Samuel GrahamGeorgia Institute of Technology

Films

Plasma Al2O3


Film/Plasma Properties

Substrates

Si3N4

Keywords

Cracking

Notes

1503