Atomic layer deposited Al2O3 capping layer effect on environmentally assisted cracking in SiNx barrier films

Type:
Journal
Info:
Journal of Applied Physics 125, 045301 (2019)
Date:
2018-12-30

Author Information

Name Institution
Kyungjin KimGeorgia Institute of Technology
Olivier N PierronGeorgia Institute of Technology
Samuel GrahamGeorgia Institute of Technology

Films


Film/Plasma Properties

Substrates

Si3N4

Notes

1503