Publication Information

Title:
Double nitridation of crystalline ZrO2/Al2O3 buffer gate stack with high capacitance, low leakage and improved thermal stability
Type:
Journal
Info:
Applied Surface Science Volume 330, 1 March 2015, Pages 221-227
Date:
2015-01-03

Author Information

Name Institution
Jhih-Jie HuangNational Taiwan University
Yi-Jen TsaiNational Taiwan University
Meng-Chen TsaiNational Taiwan University
Min-Hung LeeNational Taiwan University
Miin-Jang ChenNational Taiwan University

Films


Thermal Al2O3


Film/Plasma Properties

Substrates

Silicon

Keywords

Notes

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