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Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 36, 051503 (2018)
Date:
2018-07-02
Author Information
| Name | Institution |
|---|---|
| David R. Boris | U.S. Naval Research Laboratory |
| Virginia R. Anderson | U.S. Naval Research Laboratory |
| Neeraj Nepal | U.S. Naval Research Laboratory |
| Scooter D. Johnson | U.S. Naval Research Laboratory |
| Zachary R. Robinson | The College at Brockport SUNY |
| Alexander Campbell Kozen | U.S. Naval Research Laboratory |
| Charles R. Eddy, Jr. | U.S. Naval Research Laboratory |
| Scott G. Walton | U.S. Naval Research Laboratory |
Films
Plasma AlN
Plasma InN
Film/Plasma Properties
Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Characteristic: Electron Density, ne
Analysis: Langmuir Probe
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: GISAXS, Grazing Incidence Small Angle X-ray Scattering
Substrates
| Sapphire |
Notes
| 1273 |