Publication Information

Title:
Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 36, 051503 (2018)
Date:
2018-07-02

Author Information

Name Institution
David R. BorisU.S. Naval Research Laboratory
Virginia R. AndersonU.S. Naval Research Laboratory
Neeraj NepalU.S. Naval Research Laboratory
Scooter D. JohnsonU.S. Naval Research Laboratory
Zachary R. RobinsonThe College at Brockport SUNY
Alexander Campbell KozenU.S. Naval Research Laboratory
Charles R. Eddy, Jr.U.S. Naval Research Laboratory
Scott G. WaltonU.S. Naval Research Laboratory

Films


Plasma InN


Film/Plasma Properties

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy

Characteristic: Electron Density, ne
Analysis: Langmuir Probe

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: GISAXS, Grazing Incidence Small Angle X-ray Scattering

Substrates

Sapphire

Keywords

Notes

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