Publication Information

Title: Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy

Type: Journal

Info: Journal of Vacuum Science & Technology A 36, 051503 (2018)

Date: 2018-07-02

DOI: http://dx.doi.org/10.1116/1.5034247

Author Information

Name

Institution

U.S. Naval Research Laboratory

U.S. Naval Research Laboratory

U.S. Naval Research Laboratory

U.S. Naval Research Laboratory

The College at Brockport SUNY

U.S. Naval Research Laboratory

U.S. Naval Research Laboratory

U.S. Naval Research Laboratory

Films

Deposition Temperature = 480C

75-24-1

7727-37-9

1333-74-0

Deposition Temperature = 250C

3385-78-2

7727-37-9

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Plasma Species

OES, Optical Emission Spectroscopy

Ocean Optics HR2000+

Electron Density, ne

Langmuir Probe

Custom

Thickness

XRR, X-Ray Reflectivity

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific K-Alpha

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Bruker Fastscan/ICON

Morphology, Roughness, Topography

GISAXS, Grazing Incidence Small Angle X-ray Scattering

Synchrotron

Substrates

Sapphire

Keywords

Notes

1273



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