InN Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing InN films returned 21 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
2Perspectives on future directions in III-N semiconductor research
3In Situ Activation of an Indium(III) Triazenide Precursor for Epitaxial Growth of Indium Nitride by Atomic Layer Deposition
4Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
5The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
6Atomic layer deposition of InN using trimethylindium and ammonia plasma
7The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
8Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
9Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
10Atomic layer epitaxy for quantum well nitride-based devices
11Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
12Direct epitaxial nanometer-thin InN of high structural quality on 4H-SiC by atomic layer deposition
13Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition