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The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
Type:
Journal
Info:
J. Phys. Chem. C, 2019, 123 (42), pp 25691-25700
Date:
2019-09-26
Author Information
| Name | Institution |
|---|---|
| Polla Rouf | Linköping University |
| Nathan J. O'Brien | Linköping University |
| Karl Rönnby | Linköping University |
| Rouzbeh Samii | Linköping University |
| Ivan G. Ivanov | Linköping University |
| Lars Ojamäe | Linköping University |
| Henrik Pedersen | Linköping University |
Films
Plasma InN
Plasma InN
Plasma InN
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Raman Spectroscopy
Substrates
| Si(100) |
Notes
| 1403 |