Publication Information

Title:
The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films
Type:
Journal
Info:
J. Phys. Chem. C, 2019, 123 (42), pp 25691-25700
Date:
2019-09-26

Author Information

Name Institution
Polla RoufLinköping University
Nathan J. O'BrienLinköping University
Karl RönnbyLinköping University
Rouzbeh SamiiLinköping University
Ivan G. IvanovLinköping University
Lars OjamäeLinköping University
Henrik PedersenLinköping University

Films

Plasma InN


Plasma InN


Plasma InN


Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Raman Spectroscopy

Substrates

Si(100)

Keywords

Notes

1403