Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 37, 020910 (2019)
Date:
2018-12-21

Author Information

Name Institution
Neeraj NepalU.S. Naval Research Laboratory
Virginia R. AndersonAmerican Society for Engineering Education
Scooter D. JohnsonU.S. Naval Research Laboratory
Brian P. DowneyU.S. Naval Research Laboratory
David J. MeyerU.S. Naval Research Laboratory
Zachary R. RobinsonThe College at Brockport SUNY
Jeffrey M. WoodwardAmerican Society for Engineering Education
Karl F. Ludwig Jr.Boston University
Charles R. Eddy, Jr.U.S. Naval Research Laboratory

Films

Plasma InN


Film/Plasma Properties

Characteristic: Nucleation
Analysis: GISAXS, Grazing Incidence Small Angle X-ray Scattering

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Mobility
Analysis: Hall Measurements

Characteristic: Carrier Concentration
Analysis: Hall Measurements

Substrates

Sapphire

Notes

1430