Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 37, 020910 (2019)
Date:
2018-12-21
Author Information
| Name | Institution |
|---|---|
| Neeraj Nepal | U.S. Naval Research Laboratory |
| Virginia R. Anderson | American Society for Engineering Education |
| Scooter D. Johnson | U.S. Naval Research Laboratory |
| Brian P. Downey | U.S. Naval Research Laboratory |
| David J. Meyer | U.S. Naval Research Laboratory |
| Zachary R. Robinson | The College at Brockport SUNY |
| Jeffrey M. Woodward | American Society for Engineering Education |
| Karl F. Ludwig Jr. | Boston University |
| Charles R. Eddy, Jr. | U.S. Naval Research Laboratory |
Films
Plasma InN
Film/Plasma Properties
Characteristic: Nucleation
Analysis: GISAXS, Grazing Incidence Small Angle X-ray Scattering
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Mobility
Analysis: Hall Measurements
Characteristic: Carrier Concentration
Analysis: Hall Measurements
Substrates
| Sapphire |
Notes
| 1430 |