In(CH3)3, InMe3, TriMethyl Indium, TMI, CAS# 3385-78-2

Where to buy

NumberVendorRegionLink
1DOCK/CHEMICALSπŸ‡©πŸ‡ͺTrimethylindium
2Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTrimethylindium, 98+% (99.9+%-In)
3Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTrimethylindium, elec. gr. (99.999%-In) contained in 50 ml electropolished cylinder for CVD/ALD
4Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈTrimethylindium, elec. gr. (99.999%-In)
5Pegasus ChemicalsπŸ‡¬πŸ‡§Trimethylindium

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 28 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Perspectives on future directions in III-N semiconductor research
2Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
3Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
4Tunable band gap of III-Nitride alloys obtained by Plasma Enhanced Atomic Layer Deposition
5Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
6Growth and characterization of III-N ternary thin films by plasma assisted atomic layer epitaxy at low temperatures
7Atomic layer epitaxy for quantum well nitride-based devices
8Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering
9Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
10The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
11Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
12Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy
13Metallic indium segregation control of InN thin films grown on Si(100) by plasma-enhanced atomic layer deposition
14Direct epitaxial nanometer-thin InN of high structural quality on 4H-SiC by atomic layer deposition
15Atomic layer epitaxy for quantum well nitride-based devices
16Atomic layer deposition of InN using trimethylindium and ammonia plasma
17Perspectives on future directions in III-N semiconductor research
18Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy