Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 35, 031504 (2017)
Date:
2017-02-17
Author Information
| Name | Institution |
|---|---|
| Neeraj Nepal | U.S. Naval Research Laboratory |
| Virginia R. Anderson | American Society for Engineering Education |
| Scooter D. Johnson | U.S. Naval Research Laboratory |
| Brian P. Downey | U.S. Naval Research Laboratory |
| David J. Meyer | U.S. Naval Research Laboratory |
| Alexander DeMasi | Boston University |
| Zachary R. Robinson | The College at Brockport SUNY |
| Karl F. Ludwig Jr. | Boston University |
| Charles R. Eddy, Jr. | U.S. Naval Research Laboratory |
Films
Film/Plasma Properties
Characteristic: Nucleation
Analysis: GISAXS, Grazing Incidence Small Angle X-ray Scattering
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Carrier Concentration
Analysis: van der Pauw sheet resistance
Characteristic: Resistivity, Sheet Resistance
Analysis: van der Pauw sheet resistance
Substrates
| Sapphire |
Notes
| 1033 |