The publication database currently has 1636 entries.
203 Films Compositions
274 Precursors and Plasma Gases
77 Deposition Hardwares
251 Film and Plasma Characteristics
91 Theses
5041 Authors
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Recent Database Additions
Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
Electron-enhanced atomic layer deposition of silicon thin films at room temperature
Search 1636 plasma ALD publications by:
Search 1636 plasma ALD publications by:
Where to buy In(CH3)3, InMe3, TriMethyl Indium, TMI CAS# 3385-78-2
In(CH3)3, InMe3, TriMethyl Indium, TMI CAS# 3385-78-2 is available from the following source(s):
| Number | Vendor | Region | Link |
|---|---|---|---|
| 1 | Strem Chemicals, Inc. | 🇺🇸 | Trimethylindium, elec. gr. (99.999%-In) contained in 50 ml electropolished cylinder for CVD/ALD |
| 2 | EpiValence | 🇬🇧 | Indium Trimethyl |
| 3 | Strem Chemicals, Inc. | 🇺🇸 | Trimethylindium, 98+% (99.9+%-In) |
| 4 | Strem Chemicals, Inc. | 🇺🇸 | Trimethylindium, elec. gr. (99.999%-In) |
| 5 | DOCK/CHEMICALS | 🇩🇪 | Trimethylindium |
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