The publication database currently has 1556 entries.
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191 Films Compositions
401 Precursors and Plasma Gases
75 Deposition Hardwares
241 Film and Plasma Characteristics
83 Theses
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Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
Search 1556 plasma ALD publications by:
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Where to buy In(CH3)3, InMe3, TriMethyl Indium, TMI
In(CH3)3, InMe3, TriMethyl Indium, TMI is available from the following source(s):
| Number | Vendor | Link |
|---|---|---|
| 1 | Strem Chemicals, Inc. | Trimethylindium, elec. gr. (99.999%-In) contained in 50 ml electropolished cylinder for CVD/ALD |
| 2 | Strem Chemicals, Inc. | Trimethylindium, elec. gr. (99.999%-In) |
| 3 | Strem Chemicals, Inc. | Trimethylindium, 98+% (99.9+%-In) |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |