The publication database currently has 1531 entries.
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189 Films Compositions
401 Precursors and Plasma Gases
74 Deposition Hardwares
239 Film and Plasma Characteristics
82 Theses
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Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
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Where to buy In(CH3)3, InMe3, TriMethyl Indium, TMI
In(CH3)3, InMe3, TriMethyl Indium, TMI is available from the following source(s):
| Number | Vendor | Link |
|---|---|---|
| 1 | Strem Chemicals, Inc. | Trimethylindium, elec. gr. (99.999%-In) |
| 2 | Strem Chemicals, Inc. | Trimethylindium, 98+% (99.9+%-In) |
| 3 | Strem Chemicals, Inc. | Trimethylindium, elec. gr. (99.999%-In) contained in 50 ml electropolished cylinder for CVD/ALD |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |