Publication Information

Title:
The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 38, 040801 (2020)
Date:
2020-04-29

Author Information

Name Institution
David R. BorisU.S. Naval Research Laboratory
Virginia D. WheelerU.S. Naval Research Laboratory
Neeraj NepalU.S. Naval Research Laboratory
Syed B. QadriU.S. Naval Research Laboratory
Scott G. WaltonU.S. Naval Research Laboratory
Charles R. Eddy, Jr.U.S. Naval Research Laboratory

Films



Plasma InN



Film/Plasma Properties

Characteristic: Gas Phase Species
Analysis: OES, Optical Emission Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Strain
Analysis: XRD, X-Ray Diffraction

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Morphology, Roughness, Topography
Analysis: GISAXS, Grazing Incidence Small Angle X-ray Scattering

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

Sapphire
GaN

Keywords

Notes

1491