The role of plasma in plasma-enhanced atomic layer deposition of crystalline films
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 38, 040801 (2020)
Date:
2020-04-29
Author Information
| Name | Institution |
|---|---|
| David R. Boris | U.S. Naval Research Laboratory |
| Virginia D. Wheeler | U.S. Naval Research Laboratory |
| Neeraj Nepal | U.S. Naval Research Laboratory |
| Syed B. Qadri | U.S. Naval Research Laboratory |
| Scott G. Walton | U.S. Naval Research Laboratory |
| Charles R. Eddy, Jr. | U.S. Naval Research Laboratory |
Films
Plasma TiO2
Plasma TiO2
Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
CAS#: 3275-24-9
CAS#: 7782-44-7
CAS#: 7440-37-1
Plasma InN
Plasma InN
Film/Plasma Properties
Characteristic: Gas Phase Species
Analysis: OES, Optical Emission Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Strain
Analysis: XRD, X-Ray Diffraction
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Morphology, Roughness, Topography
Analysis: GISAXS, Grazing Incidence Small Angle X-ray Scattering
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Substrates
| Sapphire |
| GaN |
Notes
| 1491 |