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Plasma-Enhanced Atomic Layer Deposition of p-Type Copper Oxide Semiconductors with Tunable Phase, Oxidation State, and Morphology
Type:
Journal
Info:
J. Phys. Chem. C, 2021, 125 (17), pp 9383-9390
Date:
2021-04-21
Author Information
| Name | Institution |
|---|---|
| Julia D. Lenef | University of Michigan |
| Jaesung Jo | University of Michigan |
| Orlando Trejo | University of Michigan |
| David J. Mandia | University of Michigan |
| Rebecca L. Peterson | University of Michigan |
| Neil P. Dasgupta | University of Michigan |
Films
Plasma CuOx
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Optical Bandgap
Analysis: Ellipsometry
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: XANES, X-ray Absorption Near-Edge Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Transistor Characteristics
Analysis: Transistor Characterization
Substrates
| SiO2 |
Notes
| 1663 |