On-wafer fabrication of etched-mirror UV-C laser diodes with the ALD-deposited DBR
Type:
Journal
Info:
Applied Physics Letters 116, 122101 (2020)
Date:
2020-03-04
Author Information
| Name | Institution |
|---|---|
| Tadayoshi Sakai | Nagoya University |
| Maki Kushimoto | Nagoya University |
| Ziyi Zhang | Asahi Kasei Corporation |
| Naoharu Sugiyama | Nagoya University |
| Leo J. Schowalter | Nagoya University |
| Yoshio Honda | Nagoya University |
| Chiaki Sasaoka | Nagoya University |
| Hiroshi Amano | Nagoya University |
Films
Plasma Al2O3
Plasma HfO2
Film/Plasma Properties
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Reflectivity
Analysis: UV-VIS Spectroscopy
Substrates
| AlN |
| SiO2 |
| AlGaN |
Notes
| 1478 |