Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
Type:
Conference Proceedings
Info:
Optical Interference Coatings 2016
Date:
2016-06-19
Author Information
| Name | Institution |
|---|---|
| Ramutis Drazdys | State Research Institute Center for Physical Sciences and Technology |
| Laurynas Staisiūnas | State Research Institute Center for Physical Sciences and Technology |
| Konstantinas Leinartas | State Research Institute Center for Physical Sciences and Technology |
| Rytis Buzelis | State Research Institute Center for Physical Sciences and Technology |
| Tomas Tolenis | State Research Institute Center for Physical Sciences and Technology |
| Kęstutis Juškevičius | State Research Institute Center for Physical Sciences and Technology |
| Ugnius Gimževskis | State Research Institute Center for Physical Sciences and Technology |
| Algirdas Selskis | State Research Institute Center for Physical Sciences and Technology |
| Vitalija Jasulaitienė | State Research Institute Center for Physical Sciences and Technology |
Films
Plasma HfO2
Film/Plasma Properties
Characteristic: Transmittance
Analysis: Optical Transmission
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Stress
Analysis: Stress Measurement
Characteristic: Laser Induced Damage Threshold, LIDT
Analysis: Custom
Substrates
| SiO2 |
Notes
| 882 |