Publication Information

Title:
Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition
Type:
Conference Proceedings
Info:
Optical Interference Coatings 2016
Date:
2016-06-19

Author Information

Name Institution
Ramutis DrazdysState Research Institute Center for Physical Sciences and Technology
Laurynas StaisiūnasState Research Institute Center for Physical Sciences and Technology
Konstantinas LeinartasState Research Institute Center for Physical Sciences and Technology
Rytis BuzelisState Research Institute Center for Physical Sciences and Technology
Tomas TolenisState Research Institute Center for Physical Sciences and Technology
Kęstutis JuškevičiusState Research Institute Center for Physical Sciences and Technology
Ugnius GimževskisState Research Institute Center for Physical Sciences and Technology
Algirdas SelskisState Research Institute Center for Physical Sciences and Technology
Vitalija JasulaitienėState Research Institute Center for Physical Sciences and Technology

Films


Film/Plasma Properties

Characteristic: Transmittance
Analysis: Optical Transmission

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Stress
Analysis: Stress Measurement

Characteristic: Laser Induced Damage Threshold, LIDT
Analysis: Custom

Substrates

SiO2

Keywords

Notes

882