Publication Information

Title: Optical Properties of HfO2 Thin Films Grown by Atomic Layer Deposition

Type: Conference Proceedings

Info: Optical Interference Coatings 2016

Date: 2016-06-19

DOI: http://dx.doi.org/10.1364/OIC.2016.WB.2

Author Information

Name

Institution

State Research Institute Center for Physical Sciences and Technology

State Research Institute Center for Physical Sciences and Technology

State Research Institute Center for Physical Sciences and Technology

State Research Institute Center for Physical Sciences and Technology

State Research Institute Center for Physical Sciences and Technology

State Research Institute Center for Physical Sciences and Technology

State Research Institute Center for Physical Sciences and Technology

State Research Institute Center for Physical Sciences and Technology

State Research Institute Center for Physical Sciences and Technology

Films

Deposition Temperature Range = 125-250C

19962-11-9

7732-18-5

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Transmittance

Optical Transmission

PerkinElmer lambda 950 Spectrophotometer

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

VG MKII

Stress

Stress Measurement

Mahr ESDI MarSurf FI 1040 Z

Laser Induced Damage Threshold, LIDT

Custom

Custom

Substrates

SiO2

Keywords

Notes

882



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