Publication Information

Title:
The Influence of Growth Temperature on the Properties of AlN Films Grown by Atomic Layer Deposition
Type:
Journal
Info:
Acta Physica Polonica A, vol.120, no.6A, 2011.
Date:
2011-09-19

Author Information

Name Institution
Mustafa AlevliBilkent University
Çağla ÖzgitBilkent University
İnci DönmezBilkent University

Films

Plasma AlN


Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Absorption Edges
Analysis: Optical Transmission

Substrates

Si(100)
SiO2

Keywords

Notes

Ultratech Fiji PEALD AlN film study.
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