Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Design and development of nanoimprint-enabled structures for molecular motor devices

Type:
Journal
Info:
Mater. Res. Express 6 (nov) 025057
Date:
2018-10-31
DOI:
http://dx.doi.org/10.1088/2053-1591/aaed10

Author Information

Name Institution
Frida W. LindbergLund University
Till KortenTechnische Universität Dresden
Anette LöfstrandLund University
Mohammad A. RahmanLinnaeus University
Mariusz GraczykLund University
Alf MånssonLinnaeus University
Heiner LinkeLund University
Ivan MaximovLund University

Films

Plasma SiO2

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Cr

Notes

1418