Publication Information

Title:
Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
Type:
Journal
Info:
Materials Today Chemistry 11 (2019) 8-15
Date:
2018-10-03

Author Information

Name Institution
Karyn L. JarvisAustralian Nuclear Science and Technology Organisation
Peter J. EvansAustralian Nuclear Science and Technology Organisation
A. NelsonAustralian Nuclear Science and Technology Organisation
Gerry TrianiAustralian Nuclear Science and Technology Organisation

Films

Thermal Al2O3


Plasma Al2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Custom

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Substrates

PET, Polyethylene Terephthalate
Silicon

Keywords

Diffusion Barrier
Plasma vs Thermal Comparison

Notes

1218