Search 1536 plasma ALD publications by:
Search 1536 plasma ALD publications by:
Publication Information
Title:
Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
Type:
Journal
Info:
Optical Engineering, 51(10), 104003 (October 2012)
Date:
2012-09-17
Author Information
Name | Institution |
---|---|
Richard Fu | U.S. Army Research Laboratory |
James Pattison | U.S. Army Research Laboratory |
Films
Plasma Al2O3
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Substrates
HgCdTe |
Silicon |
Keywords
Notes
560 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |