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The publication database currently has 1567 entries.

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195 Films Compositions

265 Precursors and Plasma Gases

76 Deposition Hardwares

242 Film and Plasma Characteristics

84 Theses

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In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films Influence of oxygen source on the ferroelectric properties of ALD grown Hf_1-xZr_xO₂ films

Search 1567 plasma ALD publications by:

195 Films Compositions

265 Precursors and Plasma Gases

76 Deposition Hardwares

242 Film and Plasma Characteristics

Advanced thin conformal Al₂O₃ films for high aspect ratio mercury cadmium telluride sensors

Type:

Journal

Info:

Optical Engineering, 51(10), 104003 (October 2012)

Date:

2012-09-17

DOI:

http://dx.doi.org/10.1117/1.OE.51.10.104003

Author Information

Name	Institution
Richard Fu	U.S. Army Research Laboratory
James Pattison	U.S. Army Research Laboratory

Films

Plasma Al₂O₃

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji

TMA, AlMe₃, Trimethyl Aluminum

CAS#: 75-24-1

Where to buy precursor

O₂, Oxygen

CAS#: 7782-44-7

Deposition Temperature Range = 25-80C

Film/Plasma Properties

Characteristic: Thickness

Analysis: Ellipsometry

Diagnostic: J.A. Woollam

Characteristic: Morphology, Roughness, Topography

Analysis: AFM, Atomic Force Microscopy

Diagnostic: Veeco Nanoman

Characteristic: Dielectric Constant, Permittivity

Analysis: C-V, Capacitance-Voltage Measurements

Diagnostic: -

Characteristic: Conformality, Step Coverage

Analysis: SEM, Scanning Electron Microscopy