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Publication Information

Title: Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors

Type: Journal

Info: Optical Engineering, 51(10), 104003 (October 2012)

Date: 2012-09-17

DOI: http://dx.doi.org/10.1117/1.OE.51.10.104003

Author Information

Name

Institution

Richard Fu

U.S. Army Research Laboratory

James Pattison

U.S. Army Research Laboratory

Films

Plasma Al2O3 using Cambridge NanoTech Fiji

Deposition Temperature Range = 25-80C

TMA, Trimethyl Aluminum, Trimethylalane, Trimethylaluminium, Aluminium Trimethyl, Aluminum Trimethanide, Al(CH3)3, AlMe3, Al2(CH3)6, Al2Me6

75-24-1

Where to buy precursor

Oxygen, O2

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Veeco Nanoman

Dielectric Constant, Permittivity

C-V, Capacitance-Voltage Measurements

Unknown

Conformality, Step Coverage

SEM, Scanning Electron Microscopy

Unknown

Substrates

Au

Keywords

Notes

560

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I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. If you know of publications I have missed or a database entry is wrong, send me an email at: marksowa@plasma-ald.com

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