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202 Films Compositions
272 Precursors and Plasma Gases
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Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
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Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
Type:
Journal
Info:
Optical Engineering, 51(10), 104003 (October 2012)
Date:
2012-09-17
Author Information
| Name | Institution |
|---|---|
| Richard Fu | U.S. Army Research Laboratory |
| James Pattison | U.S. Army Research Laboratory |
Films
Plasma Al2O3
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Substrates
| HgCdTe |
| Silicon |
Keywords
Notes
| 560 |