Publication Information

Title:
Advanced thin conformal Al2O3 films for high aspect ratio mercury cadmium telluride sensors
Type:
Journal
Info:
Optical Engineering, 51(10), 104003 (October 2012)
Date:
2012-09-17

Author Information

Name Institution
Richard FuU.S. Army Research Laboratory
James PattisonU.S. Army Research Laboratory

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Substrates

HgCdTe
Silicon

Keywords

Notes

560