Name

Institution

Richard Fu

U.S. Army Research Laboratory

James Pattison

U.S. Army Research Laboratory

Plasma Al₂O₃ using Veeco - Ultratech - Cambridge NanoTech Fiji

Deposition Temperature Range = 25-80C

TMA, Trimethyl Aluminum, Trimethylalane, Trimethylaluminium, Aluminium Trimethyl, Aluminum Trimethanide, Al(CH₃)₃, AlMe₃, Al₂(CH₃)₆, Al₂Me₆

75-24-1

Where to buy precursor

Oxygen, O₂

7782-44-7

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Veeco Nanoman

Dielectric Constant, Permittivity

C-V, Capacitance-Voltage Measurements

Unknown

Conformality, Step Coverage

SEM, Scanning Electron Microscopy

Unknown

Au

560