Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy

Type:
Journal
Info:
Scripta Materialia, Volume 93, Pages 44 - 47
Date:
2014-08-31

Author Information

Name Institution
Neeraj NepalU.S. Naval Research Laboratory
Ramasis GoswamiU.S. Naval Research Laboratory
Syed B. QadriU.S. Naval Research Laboratory
Nadeemullah A. MahadikU.S. Naval Research Laboratory
Francis J. KubU.S. Naval Research Laboratory
Charles R. Eddy, Jr.U.S. Naval Research Laboratory

Films



Plasma AlN


Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope

Substrates

Si(100)
HfO2
Pt

Keywords

Notes

1381