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Growth of AlN/Pt heterostructures on amorphous substrates at low temperatures via atomic layer epitaxy
Type:
Journal
Info:
Scripta Materialia, Volume 93, Pages 44 - 47
Date:
2014-08-31
Author Information
| Name | Institution |
|---|---|
| Neeraj Nepal | U.S. Naval Research Laboratory |
| Ramasis Goswami | U.S. Naval Research Laboratory |
| Syed B. Qadri | U.S. Naval Research Laboratory |
| Nadeemullah A. Mahadik | U.S. Naval Research Laboratory |
| Francis J. Kub | U.S. Naval Research Laboratory |
| Charles R. Eddy, Jr. | U.S. Naval Research Laboratory |
Films
Plasma HfO2
Plasma Pt
Plasma AlN
Film/Plasma Properties
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Substrates
| Si(100) |
| HfO2 |
| Pt |
Notes
| 1381 |