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Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
Type:
Journal
Info:
Chem. Mater. 2019, 31, 3900-3908
Date:
2019-05-13
Author Information
| Name | Institution |
|---|---|
| Jason R. Avila | American Society for Engineering Education |
| Syed B. Qadri | U.S. Naval Research Laboratory |
| Jaime A. Freitas | U.S. Naval Research Laboratory |
| Neeraj Nepal | U.S. Naval Research Laboratory |
| David R. Boris | U.S. Naval Research Laboratory |
| Scott G. Walton | U.S. Naval Research Laboratory |
| Charles R. Eddy, Jr. | U.S. Naval Research Laboratory |
| Virginia D. Wheeler | U.S. Naval Research Laboratory |
Films
Plasma TiO2
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Raman Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Strain
Analysis: XRD, X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Damage, Defects
Analysis: CL, Cathodoluminescence
Substrates
| Sapphire |
Notes
| 1513 |