Publication Information

Title:
Impact of Growth Conditions on the Phase Selectivity and Epitaxial Quality of TiO2 Films Grown by the Plasma-Assisted Atomic Layer Deposition
Type:
Journal
Info:
Chem. Mater. 2019, 31, 3900-3908
Date:
2019-05-13

Author Information

Name Institution
Jason R. AvilaAmerican Society for Engineering Education
Syed B. QadriU.S. Naval Research Laboratory
Jaime A. FreitasU.S. Naval Research Laboratory
Neeraj NepalU.S. Naval Research Laboratory
David R. BorisU.S. Naval Research Laboratory
Scott G. WaltonU.S. Naval Research Laboratory
Charles R. Eddy, Jr.U.S. Naval Research Laboratory
Virginia D. WheelerU.S. Naval Research Laboratory

Films


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Raman Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Strain
Analysis: XRD, X-Ray Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Damage, Defects
Analysis: CL, Cathodoluminescence

Substrates

Sapphire

Keywords

Notes

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