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Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
Gallium nitride thin films by microwave plasma-assisted ALD
Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
Type:
Journal
Info:
Journal of Applied Physics 119, 244101 (2016)
Date:
2016-06-08
Author Information
| Name | Institution |
|---|---|
| M. Kassmi | Grenoble Alps University (UGA) |
| John Pointet | Grenoble Alps University (UGA) |
| Patrice Gonon | Grenoble Alps University (UGA) |
| Ahmad Bsiesy | Grenoble Alps University (UGA) |
| Christophe Vallée | Grenoble Alps University (UGA) |
| F. Jomni | El Manar University |
Films
Plasma AlTixOy
Film/Plasma Properties
Substrates
Notes
| 834 |