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Atomic layer epitaxy of germanium
Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films
Plasma-assisted atomic layer deposition of nickel oxide as hole transport layer for hybrid perovskite solar cells
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Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO2 thin films grown by the atomic layer deposition technique
Type:
Journal
Info:
Journal of Applied Physics 119, 244101 (2016)
Date:
2016-06-08
Author Information
| Name | Institution |
|---|---|
| M. Kassmi | Grenoble Alps University (UGA) |
| John Pointet | Grenoble Alps University (UGA) |
| Patrice Gonon | Grenoble Alps University (UGA) |
| Ahmad Bsiesy | Grenoble Alps University (UGA) |
| Christophe Vallée | Grenoble Alps University (UGA) |
| F. Jomni | El Manar University |
Films
Plasma AlTixOy
Film/Plasma Properties
Substrates
Keywords
Notes
| 834 |