Publication Information

Title: Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD

Type: Journal

Info: ACS Appl. Mater. Interfaces, 2012, 4(6), pp 3122-3128

Date: 2012-05-11

DOI: http://dx.doi.org/10.1021/am300458q

Author Information

Name

Institution

University of Arkansas at Little Rock

University of Arkansas at Little Rock

Films

Deposition Temperature = 200C

557-20-0

7732-18-5

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Morphology, Roughness, Topography

SEM, Scanning Electron Microscopy

JEOL JSM-7000F

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

SEM, Scanning Electron Microscopy

JEOL JSM-7000F

Optical Properties

PL, PhotoLuminescence

Custom

Chemical Composition, Impurities

EDS, EDX, Energy Dispersive X-ray Spectroscopy

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Resistivity, Sheet Resistance

Hall effect/van der Pauw method

Custom

Mobility

Hall effect/van der Pauw method

Custom

Carrier Concentration

Hall effect/van der Pauw method

Custom

Substrates

Keywords

ZnO

Atomic Layer Deposition

O2 Plasma

Resistivity

Hall Effect

Photoluminescence

Notes

24



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