Publication Information

Title:
Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2012, 4(6), pp 3122-3128
Date:
2012-05-11

Author Information

Name Institution
Matthew A. ThomasUniversity of Arkansas at Little Rock
J.B. CuiUniversity of Arkansas at Little Rock

Films

Plasma ZnO


Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Optical Properties
Analysis: PL, PhotoLuminescence

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Resistivity, Sheet Resistance
Analysis: Hall effect/van der Pauw method

Characteristic: Mobility
Analysis: Hall effect/van der Pauw method

Characteristic: Carrier Concentration
Analysis: Hall effect/van der Pauw method

Substrates

Keywords

ZnO
Atomic Layer Deposition
O2 Plasma
Resistivity
Hall Effect
Photoluminescence

Notes

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