Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD
Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2012, 4(6), pp 3122-3128
Date:
2012-05-11
Author Information
| Name | Institution |
|---|---|
| Matthew A. Thomas | University of Arkansas at Little Rock |
| J.B. Cui | University of Arkansas at Little Rock |
Films
Plasma ZnO
Film/Plasma Properties
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Optical Properties
Analysis: PL, PhotoLuminescence
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Resistivity, Sheet Resistance
Analysis: Hall effect/van der Pauw method
Characteristic: Mobility
Analysis: Hall effect/van der Pauw method
Characteristic: Carrier Concentration
Analysis: Hall effect/van der Pauw method
Substrates
Notes
| 24 |