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Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films
Gallium nitride thin films by microwave plasma-assisted ALD
Ferroelectricity of HfxZr1-xO2 thin films fabricated by 300°C low temperature process with plasma-enhanced atomic layer deposition
Hydrogen-induced abstraction mechanism of surface methyl groups in atomic-layer-epitaxy of germanium
Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
Type:
Journal
Info:
Optics Express, v. 24, n. 7, p. 7654--7669 (2016)
Date:
2016-02-29
Author Information
| Name | Institution |
|---|---|
| Luis Melo | University of Victoria |
| Geoff Burton | University of Victoria |
| Philip Kubik | Simon Fraser University |
| Peter Wild | University of Victoria |
Films
Plasma HfO2
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Substrates
| Silicon |
Notes
| Available as section 3.3 in on-line thesis. |
| 780 |