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Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
Innovative remote plasma source for atomic layer deposition for GaN devices
Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
Optical in situ monitoring of plasma-enhanced atomic layer deposition process
The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
Type:
Journal
Info:
Optics Express, v. 24, n. 7, p. 7654--7669 (2016)
Date:
2016-02-29
Author Information
| Name | Institution |
|---|---|
| Luis Melo | University of Victoria |
| Geoff Burton | University of Victoria |
| Philip Kubik | Simon Fraser University |
| Peter Wild | University of Victoria |
Films
Plasma HfO2
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Substrates
| Silicon |
Keywords
Notes
| Available as section 3.3 in on-line thesis. |
| 780 |