2021 Year in Review
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Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
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Long period gratings coated with hafnium oxide by plasma-enhanced atomic layer deposition for refractive index measurements
Type:
Journal
Info:
Optics Express, v. 24, n. 7, p. 7654--7669 (2016)
Date:
2016-02-29
Author Information
| Name | Institution |
|---|---|
| Luis Melo | University of Victoria |
| Geoff Burton | University of Victoria |
| Philip Kubik | Simon Fraser University |
| Peter Wild | University of Victoria |
Films
Plasma HfO2
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Substrates
| Silicon |
Keywords
Notes
| Available as section 3.3 in on-line thesis. |
| 780 |