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Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Mechanical properties of thin-film Parylene-metal-Parylene devices
Type:
Journal
Info:
Front. Mech. Eng. 1:10 (2015)
Date:
2015-08-18
Author Information
| Name | Institution |
|---|---|
| Curtis D Lee | University of Southern California (USC) |
| Ellis Meng | University of Southern California (USC) |
Films
Plasma Al2O3
Film/Plasma Properties
Characteristic: Adhesion
Analysis: Custom
Characteristic: Bending Fatigue
Analysis: Custom
Characteristic: Damage, Defects
Analysis: EIS, Electrochemical Impedance Spectroscopy
Substrates
| Parylene-N |
| Pt |
Keywords
Notes
| 1392 |