Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Mechanical properties of thin-film Parylene-metal-Parylene devices

Type:
Journal
Info:
Front. Mech. Eng. 1:10 (2015)
Date:
2015-08-18
DOI:
http://dx.doi.org/10.3389/fmech.2015.00010

Author Information

Name Institution
Curtis D LeeUniversity of Southern California (USC)
Ellis MengUniversity of Southern California (USC)

Films

Plasma Al2O3

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Adhesion
Analysis: Custom
Diagnostic: Custom

Characteristic: Bending Fatigue
Analysis: Custom
Diagnostic: Custom

Characteristic: Damage, Defects
Analysis: EIS, Electrochemical Impedance Spectroscopy
Diagnostic: -

Substrates

Parylene-N
Pt

Notes

1392