The publication database currently has 1700 entries.
Use Advanced Search for more complex searches
Innatiux is a retained executive recruiting firm with a focus on the search and placement of proven leaders for client companies in the field of high-tech capital equipment and analytical instrumentation. We are seeking WW technical and business leaders with a background in semiconductor deposition to fill confidential senior and executive level positions with our clients. Visit us at: www.innatiux.com
Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Journal of Crystal Growth 312 (2010) 2215-2219
Date:
2010-04-23
Author Information
| Name | Institution |
|---|---|
| Han-Bo-Ram Lee | Yonsei University |
| Hyungjun Kim | Yonsei University |
Films
Plasma CoSi2
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Areal Density
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Substrates
| Si(001) |
| CoSi2 |
Notes
| 1680 |