Hyungjun Kim Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Hyungjun Kim returned 44 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic Layer Deposition of Ruthenium and Ruthenium-oxide Thin Films by Using a Ru(EtCp)2 Precursor and Oxygen Gas
2Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
3Atomic scale nitrogen depth profile control during plasma enhanced atomic layer deposition of high k dielectrics
4Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
5Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
6Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
7Degradation of the deposition blocking layer during area-selective plasma-enhanced atomic layer deposition of cobalt
8Dielectric barrier characteristics of Si-rich silicon nitride films deposited by plasma enhanced atomic layer deposition
9Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
10Effect of Crystal Structure and Grain Size on Photo-Catalytic Activities of Remote-Plasma Atomic Layer Deposited Titanium Oxide Thin Film
11Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
12Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO2
13Flatband voltage control in p-metal gate metal-oxide-semiconductor field effect transistor by insertion of TiO2 layer
14Formation of Ni silicide from atomic layer deposited Ni
15Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition
16Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
17Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
18Growth characteristics and properties of Ga-doped ZnO (GZO) thin films grown by thermal and plasma-enhanced atomic layer deposition
19Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
20Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
21Growth of cubic-TaN thin films by plasma-enhanced atomic layer deposition
22HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer
23High-Quality Cobalt Thin Films by Plasma-Enhanced Atomic Layer Deposition
24Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
25In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
26Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition
27Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
28Nitride mediated epitaxy of CoSi2 through self-interlayer-formation of plasma-enhanced atomic layer deposition Co
29Photocatalytic activities of TiO2 thin films prepared on Galvanized Iron substrate by plasma-enhanced atomic layer deposition
30Photocatalytic functional coatings of TiO2 thin films on polymer substrate by plasma enhanced atomic layer deposition
31Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
32Plasma-Enhanced ALD of TiO2 Thin Films on SUS 304 Stainless Steel for Photocatalytic Application
33Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
34Plasma-Enhanced Atomic Layer Deposition of Ni
35Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
36Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
37Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition
38The Effects of UV Exposure on Plasma-Enhanced Atomic Layer Deposition ZnO Thin Film Transistor
39The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties
40The physical properties of cubic plasma-enhanced atomic layer deposition TaN films
41Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode
42Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
43Very high frequency plasma reactant for atomic layer deposition
44Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition


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