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Spontaneous Formation of Vertical Magnetic-Metal-Nanorod Arrays During Plasma-Enhanced Atomic Layer Deposition

Type:
Journal
Info:
Small 2008, 4, No. 12, 2247-2254
Date:
2008-10-30
DOI:
http://dx.doi.org/10.1002/smll.200801074

Author Information

Name Institution
Han-Bo-Ram LeePohang University of Science and Technology (POSTECH)
Gil-Ho GuPohang University of Science and Technology (POSTECH)
J. Y. SonPohang University of Science and Technology (POSTECH)
Chan Gyung ParkPohang University of Science and Technology (POSTECH)
Hyungjun KimPohang University of Science and Technology (POSTECH)

Films

Plasma Co

Hardware used: Quros Plus 150
cobaltacene, bis(cyclopentadienyl)cobalt, Cp2Co
CAS#: 1277-43-6
NH3, Ammonia
CAS#: 7664-41-7
SiH4, Silane
CAS#: 7803-62-5
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature Range N/A

Plasma Ni

Hardware used: Quros Plus 150
MABONi, Ni(dmamb)2, bis(dimethylamino-2-methyl-2-butoxo)nickel
CAS#: 942311-35-5
NH3, Ammonia
CAS#: 7664-41-7
SiH4, Silane
CAS#: 7803-62-5
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: -

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Diagnostic: JEOL 2100F

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Diagnostic: JEOL 2100F

Characteristic: Chemical Composition, Impurities
Analysis: ELS, EELS, Electron Energy Loss Spectroscopy
Diagnostic: JEOL 2100F

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Diagnostic: JEOL 2100F

Characteristic: Magnetic Properties
Analysis: SQUID, Superconducting Quantum Interference Device
Diagnostic: Quantum Design MPMS

Substrates

Si(001)
SiO2

Notes

1017