Name

Institution

Han-Bo-Ram Lee

Pohang University of Science and Technology (POSTECH)

Gil-Ho Gu

Pohang University of Science and Technology (POSTECH)

J. Y. Son

Pohang University of Science and Technology (POSTECH)

Chan Gyung Park

Pohang University of Science and Technology (POSTECH)

Hyungjun Kim

Pohang University of Science and Technology (POSTECH)

Plasma Co using Quros Plus 150

Deposition Temperature Range N/A

Cp₂Co, Cobaltacene, Bis(cyclopentadienyl)cobalt

1277-43-6

Where to buy precursor

NH₃, Ammonia

7664-41-7

SiH₄, Silane

7803-62-5

H₂, Hydrogen

1333-74-0

Plasma Ni using Quros Plus 150

Deposition Temperature Range N/A

bis(dimethylamino-2-methyl-2-butoxo)nickel, [Ni(dmamb)₂]

942311-35-5

NH₃, Ammonia

7664-41-7

SiH₄, Silane

7803-62-5

H₂, Hydrogen

1333-74-0

Characteristic

Analysis

Diagnostic

Morphology, Roughness, Topography

SEM, Scanning Electron Microscopy

Unknown

Images

SEM, Scanning Electron Microscopy

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Unknown

Microstructure

TEM, Transmission Electron Microscope

JEOL 2100F

Images

TEM, Transmission Electron Microscope

JEOL 2100F

Chemical Composition, Impurities

ELS, EELS, Electron Energy Loss Spectroscopy

JEOL 2100F

Chemical Composition, Impurities

EDS, EDX, Energy Dispersive X-ray Spectroscopy

JEOL 2100F

Magnetic Properties

SQUID, Superconducting Quantum Interference Device

Quantum Design MPMS

Si(001)

SiO₂

1017