Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor

Type:
Journal
Info:
Japanese Journal of Applied Physics 49, 05FA10 (2010)
Date:
2010-01-09

Author Information

Name Institution
Jae-Min KimYonsei University
Han-Bo-Ram LeeYonsei University
Clement Lansalot-MatrasAir Liquide
Christian DussarratAir Liquide
Julien GatineauAir Liquide
Hyungjun KimYonsei University

Films

Plasma Co


Film/Plasma Properties

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

Si(001)
SiO2

Keywords

Metallic Thin Films

Notes

710