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Publication Information

Title: Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor

Type: Journal

Info: Japanese Journal of Applied Physics 49, 05FA10 (2010)

Date: 2010-01-09

DOI: http://dx.doi.org/10.1143/JJAP.49.05FA10

Author Information

Name

Institution

Yonsei University

Yonsei University

Air Liquide

Air Liquide

Air Liquide

Yonsei University

Films

Plasma Co using Quros Plus 150

Deposition Temperature Range = 100-300C

0-0-0

7664-41-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Resistivity, Sheet Resistance

Four-point Probe

Unknown

Images

SEM, Scanning Electron Microscopy

Unknown

Thickness

SEM, Scanning Electron Microscopy

Unknown

Morphology, Roughness, Topography

SEM, Scanning Electron Microscopy

Unknown

Bonding States

XPS, X-ray Photoelectron Spectroscopy

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Substrates

Si(001)

SiO2

Keywords

Metallic Thin Films

Notes

710


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