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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Christian Dussarrat Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Christian Dussarrat returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
2Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
3PEALD of Copper using New Precursors for Next Generation of Interconnections
4Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor
5Ultra-Low Temperature Deposition of Copper Seed Layers by PEALD
6Copper-ALD Seed Layer as an Enabler for Device Scaling