Search 1628 plasma ALD publications by:
Search 1628 plasma ALD publications by:
Growth characteristics and properties of Ga-doped ZnO (GZO) thin films grown by thermal and plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Applied Surface Science 295 (2014) 260 - 265
Date:
2014-01-06
Author Information
Name | Institution |
---|---|
Taewook Nam | Yonsei University |
Chang Wan Lee | Yonsei University |
Hyun Jae Kim | Yonsei University |
Hyungjun Kim | Yonsei University |
Films
Thermal Ga:ZnO
Hardware used: Atomic Premium CN1
Plasma Ga:ZnO
Hardware used: Atomic Premium CN1
Film/Plasma Properties
Substrates
Keywords
PEALD Film Development |
Plasma vs Thermal Comparison |
Notes
452 |