Publication Information

Title:
Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
Type:
Journal
Info:
Current Applied Physics Volume 17, Issue 3, 2017, Pages 333 - 338
Date:
2016-12-23

Author Information

Name Institution
Il-Kwon OhYonsei University
Hyungjun KimYonsei University
Han-Bo-Ram LeeIncheon National University

Films

Plasma Co


Film/Plasma Properties

Characteristic: Gas Phase Species
Analysis: QMS, Quadrupole Mass Spectrometer

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

Si-H

Keywords

Notes

894