Il-Kwon Oh Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Il-Kwon Oh returned 9 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
2Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
3Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
4Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
5Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
6Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
7Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
8In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
9Very high frequency plasma reactant for atomic layer deposition