Il-Kwon Oh Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Il-Kwon Oh returned 10 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
2Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
3Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
4In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
5Growth mechanism and electrical properties of tungsten films deposited by plasma-enhanced atomic layer deposition with chloride and metal organic precursors
6Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
7Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas
8Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
9Very high frequency plasma reactant for atomic layer deposition
10Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor