2022 Year in Review

April 2023 Stats


The publication database currently has 1686 entries.
208 Films
282 Precursors
78 Dep Hardware Sets
254 Characteristics
93 Theses
5172 Authors

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2021 Year in Review
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Recent Database Additions
Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1-xO2 thin films using synchrotron x-ray analysis Experimental and theoretical determination of the role of ions in atomic layer annealing Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature

Il-Kwon Oh Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Il-Kwon Oh returned 9 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
2Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
3Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
4In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides
5Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors
6Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
7Very high frequency plasma reactant for atomic layer deposition
8Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor
9Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas

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