Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition

Type:
Journal
Info:
Applied Surface Science 425 (2017) 781 - 787
Date:
2017-06-23

Author Information

Name Institution
Kangsik KimUlsan National Institute of Science and Technology
Il-Kwon OhYonsei University
Hyungjun KimYonsei University
Zonghoon LeeUlsan National Institute of Science and Technology

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: TEM, Transmission Electron Microscope

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Strain
Analysis: HAADF, High-Angle Annular Dark Field

Characteristic: Interfacial Layer
Analysis: HAADF, High-Angle Annular Dark Field

Characteristic: Chemical Composition, Impurities
Analysis: ARXPS, Angle Resolved X-ray Photoelectron Spectroscopy

Characteristic: Damage, Defects
Analysis: -

Substrates

Silicon

Keywords

Notes

Compares 13.56MHz and 60MHz plasma sources.
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