Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


SNTEK Co. ALD 5008 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using SNTEK Co. ALD 5008 hardware returned 5 records. If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Very high frequency plasma reactant for atomic layer deposition
2Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
3Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
4Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
5In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides