Publication Information

Title:
Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
Type:
Journal
Info:
Journal of the Korean Physical Society, Vol. 59, No. 21, pp. 452-457
Date:
2011-05-30

Author Information

Name Institution
Taewook NamYonsei University
Jae-Min KimYonsei University
Min-Kyu KimYonsei University
Hyungjun KimYonsei University
Woo-Hee KimHanyang University

Films

Thermal Al2O3



Thermal ZnO


Plasma Al2O3


Plasma TiO2


Plasma ZnO


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Microstructure
Analysis: XRD, X-Ray Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

Si(001)

Keywords

Low-Temperature

Notes

689