Publication Information

Title: Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films

Type: Journal

Info: Journal of the Korean Physical Society, Vol. 59, No. 21, pp. 452-457

Date: 2011-05-30

DOI: https://doi.org/10.3938/jkps.59.452

Author Information

Name

Institution

Yonsei University

Yonsei University

Yonsei University

Yonsei University

Hanyang University

Films

Deposition Temperature Range = 25-300C

75-24-1

7732-18-5

Thermal TiO2 using SNTEK Co. ALD 5008

Deposition Temperature Range = 25-300C

3275-24-9

7732-18-5

Thermal ZnO using SNTEK Co. ALD 5008

Deposition Temperature Range = 25-300C

557-20-0

7732-18-5

Plasma Al2O3 using Custom

Deposition Temperature Range = 25-300C

75-24-1

7782-44-7

Plasma TiO2 using Custom

Deposition Temperature Range = 25-300C

3275-24-9

7782-44-7

Plasma ZnO using Custom

Deposition Temperature Range = 25-300C

557-20-0

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Unknown

Refractive Index

Ellipsometry

Unknown

Conformality, Step Coverage

SEM, Scanning Electron Microscopy

Unknown

Morphology, Roughness, Topography

SEM, Scanning Electron Microscopy

Unknown

Microstructure

XRD, X-Ray Diffraction

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Substrates

Si(001)

Keywords

Low-Temperature

Notes

689



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