Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
Type:
Journal
Info:
Journal of the Korean Physical Society, Vol. 59, No. 21, pp. 452-457
Date:
2011-05-30
Author Information
| Name | Institution |
|---|---|
| Taewook Nam | Yonsei University |
| Jae-Min Kim | Yonsei University |
| Min-Kyu Kim | Yonsei University |
| Hyungjun Kim | Yonsei University |
| Woo-Hee Kim | Hanyang University |
Films
Thermal Al2O3
Thermal TiO2
Thermal ZnO
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Microstructure
Analysis: XRD, X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Substrates
| Si(001) |
Notes
| 689 |