About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC.

Plasma ALD, LLC designs and supplies compact inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to an ALD system can learn more on our Plasma Sources page.

Min-Kyu Kim Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Min-Kyu Kim returned 3 record(s).

NumberTitle
1Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition
2Low-temperature atomic layer deposition of TiO2, Al2O3,and ZnO thin films
3Flexible insulator of hollow SiO2 spheres and polyimide hybrid for flexible OLED