The publication database currently has 1655 entries.
Use Advanced Search for more complex searches
Recent Database Additions
Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
Innovative remote plasma source for atomic layer deposition for GaN devices
Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
Optical in situ monitoring of plasma-enhanced atomic layer deposition process
The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
Flexible insulator of hollow SiO2 spheres and polyimide hybrid for flexible OLED
Type:
Journal
Info:
Phys. Chem. Chem. Phys., 2015,17, 2416-2420
Date:
2014-11-25
Author Information
| Name | Institution |
|---|---|
| Min-Kyu Kim | Sungkyunkwan University |
Films
Plasma SiO2
Hardware used: Synos PEALD
Film/Plasma Properties
Characteristic: Dielectric Constant, Permittivity
Analysis: -
Characteristic: Thermal Stability
Analysis: -
Characteristic: Leakage Current
Analysis: -
Substrates
Keywords
| Flexible Circuits |
| OLED |
Notes
| 251 |