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Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
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Publication Information
Title:
Flexible insulator of hollow SiO2 spheres and polyimide hybrid for flexible OLED
Type:
Journal
Info:
Phys. Chem. Chem. Phys., 2015,17, 2416-2420
Date:
2014-11-25
Author Information
| Name | Institution |
|---|---|
| Min-Kyu Kim | Sungkyunkwan University |
Films
Plasma SiO2
Hardware used: Synos PEALD
Film/Plasma Properties
Characteristic: Dielectric Constant, Permittivity
Analysis: -
Characteristic: Thermal Stability
Analysis: -
Characteristic: Leakage Current
Analysis: -
Substrates
Keywords
| Flexible Circuits |
| OLED |
Notes
| 251 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |