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Flexible insulator of hollow SiO2 spheres and polyimide hybrid for flexible OLED

Type:
Journal
Info:
Phys. Chem. Chem. Phys., 2015,17, 2416-2420
Date:
2014-11-25
DOI:
http://dx.doi.org/10.1039/C4CP04266B

Author Information

Name Institution
Min-Kyu KimSungkyunkwan University

Films

Plasma SiO2

Hardware used: Synos PEALD
Deposition Temperature = 80C

Film/Plasma Properties

Characteristic: Dielectric Constant, Permittivity
Analysis: -
Diagnostic: -

Characteristic: Thermal Stability
Analysis: -
Diagnostic: -

Characteristic: Leakage Current
Analysis: -
Diagnostic: -

Substrates

Notes

251