Publication Information

Title:
Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
Type:
Journal
Info:
J. Phys. Chem. C, 2016, 120 (11), pp 5958-5967
Date:
2016-03-11

Author Information

Name Institution
Bo-Eun ParkYonsei University
Il-Kwon OhYonsei University
Chang Wan LeeYonsei University
Gyeongho LeeYonsei University
Young-Han ShinUniversity of Ulsan
Clement Lansalot-MatrasAir Liquide
Wontae NohAir Liquide
Hyungjun KimYonsei University
Han-Bo-Ram LeeIncheon National University

Films

Plasma HfO2

Hardware used: Unknown


CAS#: 7782-44-7

Plasma HfO2


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: -

Characteristic: Breakdown Voltage
Analysis: I-V, Current-Voltage Measurements

Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements

Substrates

Keywords

Notes

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