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Your search for publications using this chemistry returned 5 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Radical Enhanced Atomic Layer Deposition of Metals and Oxides|
|2||Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2|
|3||High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning|
|4||Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V|
|5||Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning|
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