Hafnium Tetrachloride, HfCl4, CAS# 13499-05-3

Where to buy

NumberVendorRegionLink
1EntegrisπŸ‡ΊπŸ‡ΈHfCl4
2EpiValenceπŸ‡¬πŸ‡§Hafnium chloride
3EreztechπŸ‡ΊπŸ‡ΈHafnium (IV) Chloride
4Pegasus ChemicalsπŸ‡¬πŸ‡§Hafnium tetrachloride

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
2Radical Enhanced Atomic Layer Deposition of Metals and Oxides
3Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
4Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
5Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
6Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
7Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning