Hafnium Tetrachloride, HfCl4, CAS# 13499-05-3

Where to buy

NumberVendorRegionLink
1EntegrisπŸ‡ΊπŸ‡ΈHfCl4
2EpiValenceπŸ‡¬πŸ‡§Hafnium chloride
3EreztechπŸ‡ΊπŸ‡ΈHafnium (IV) Chloride

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Radical Enhanced Atomic Layer Deposition of Metals and Oxides
2Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing
3Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
4High-k GaAs metal insulator semiconductor capacitors passivated by ex-situ plasma-enhanced atomic layer deposited AlN for Fermi-level unpinning
5Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C-V
6Interfaces of high-k dielectrics on GaAs: Their common features and the relationship with Fermi level pinning
7Atomic Layer Deposition: An Enabling Technology for Microelectronic Device Manufacturing