Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Where to buy Bis(ethylcyclopentadienyl)hafnium(IV) dichloride, Hf(C2H5C5H4)2Cl2, Hf(EtCp)2Cl2 CAS# 78205-93-3

Bis(ethylcyclopentadienyl)hafnium(IV) dichloride, Hf(C2H5C5H4)2Cl2, Hf(EtCp)2Cl2 CAS# 78205-93-3 is available from the following source(s):

NumberVendorRegionLink
1Ereztech🇺🇸Bis(ethylcyclopentadienyl) hafnium dichloride

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