Bis(ethylcyclopentadienyl)hafnium(IV) dichloride, Hf(C2H5C5H4)2Cl2, Hf(EtCp)2Cl2, CAS# 78205-93-3

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Plasma Enhanced Atomic Layer Deposition Film Publications

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1Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2